Description
Features
– Precise Control of Plating Current Waveform
– EFORM Software Control of RPP Parameters and Plating Cycle
– Multi Stage Process with RPP or DC Current Control
– Total Amp-Hour Target Set Point per Program
– User Friendly GUI
– Process Data Collection and Storage
Specifications for DMC3-RPP5-DC27
| Dimensions | 4U 431 mm x 146 mm x 508 mm 17 in x 5.75 in x 20 in |
| Input | 100-240 VAC 50/60 Hz |
| Output | |
| – Reverse Pulse | 0 +/- 10.00 AMPS 0-10.00 V RMS |
| – DC | 5.1-27.0 AMPS 0-24.0 V DC |
| Control | RS-485, Digital |
| WaveForm | 3 steps (2 + zero dwell) Programmable to 10 Khz Square Wave |
